
Shibuya Startup Support (SSS) in collaboration with DIG SHIBUYA will host a five-day program, Creative Tech Shibuya 2026, for overseas creative tech startups considering entering the Japanese market. The program aims to support foreign startups in entering Japan, promote collaboration with Japanese companies, and support fundraising from investors.
The program will officially collaborate with an urban art and technology event, DIG SHIBUYA 2026. Participating startups will gain access to a slew of benefits, including presentation and product showcase opportunities, business matching with Japanese companies and investors, and workshops led by experts. Many overseas startups aiming to introduce new culture and innovation or to explore expansion into the Japanese market are expected to participate.
Program Overview
Dates: February 11 (Wed, National Holiday) – February 15 (Sun), 2026 (some sessions by invitation only)
Format: On-site program in Shibuya
Location: Shibuya Stream Hall and surrounding venues
Details: 5-day program for overseas creative startups
Organizers: Shibuya Startup Support, Shibuya City
Startup Application Deadline: Sunday, November 23, 2025
Target Startups
Participant Profile
Examples of Collaboration Opportunities
Participate in workshops, group discussions, and company visits to build early relationships with overseas startups
Agenda
Day 1|February 11 (Wed, National Holiday)
Kickoff & Welcome Party
Day 2|February 12 (Thu)
Workshops, group discussions, company visits, networking sessions
Day 3|February 13 (Fri)
Presentations, exhibitions, business matching, and networking within DIG SHIBUYA 2026
Days 4–5|February 14 (Sat) – 15 (Sun)
Participation in DIG SHIBUYA 2026 side events, farewell party, and walking tour of the Shibuya/Yoyogi Park area
How to Apply
▶︎ Overseas Startups
Please apply via the form below.
(Application deadline: November 23, 2025)
▶︎ Japanese Companies & Investors
For companies and investors interested in collaborating with this program, please contact us through the form below.